Epitaxial Materials

Invited Speakers:

  • Koushik Banerjee, Intel Corporation, USA
    III-V Superlattice based Longer Wavelength Infrared Avalanche Photodiode
  • Yingge Du, Pacific Northwest National Laboratory, USA
    Growth and applications of epitaxial tungsten trioxide (WO3) thin films
  • Han Huang, Central South University, China
    Incorporating isolated molybdenum (Mo) atoms into Bilayer Epitaxial Graphene on 4H-SiC(0001)
  • Franck Natali, Victoria University of Wellington, New Zealand
    Rare Earth Nitrides: Novel Intrinsic Ferromagnetic Semiconductors
  • Gang Niu, IHP, Germany
    Molecular beam epitaxy of functional (Ce,Pr)O2-δ films on silicon
  • Keisuke Shibuya, National Institute of Advanced Industrial Science and Technology(AIST), Japan
    Electronic phase control in vanadium dioxide thin films
  • Tomoaki Yamada, Nagoya University, Japan
    Self-assembled epitaxial ferroelectric nanorods for large electromechanical response
  • Tomohiro Yamaguchi, Kogakuin University, Japan
    Growth of InGaN Alloys using DERI Method and Fabrication of LED structures

 

 

Workshop Chairs:

  • Giovanni Isella, LNESS Como, Italy
Operating Organization
OAHOST
Sponsors
UESTC
University of Electronic Science and Technology of China
UARK

Springer